Peter Ventzek

Peter Ventzek (1964–) is an engineer. In 2006 he received the NOGLSTP GLBT engineer award for outstanding contributions to the semiconductor industry.

Early life and education

Ventzek was born in Columbus, Georgia in 1964.[1] He received B.S. in Chemical Engineering from the University of New Brunswick and his PhD in Nuclear Engineering from the University of Michigan.[2] His graduate research with Professor Ronald Gilgenbach dealt with the dynamics of laser ablation plasmas for materials processing.

Career and research

As a post-doctoral researcher at the University of Illinois, Ventzek developed a multi-dimensional computer platform for plasma sources for material processing.[1] In 1994, Ventzek joined Hokkaido University in Japan as Associate Professor in the Department of Electrical Engineering.[1] His research dealt with plasma process control, laser ablation, neutral beam sources and atmospheric pressure discharges.

In 1997, Ventzek joined Motorola/Freescale to direct the development of integrated computational platforms for plasma etching and deposition. Ventzek has published over 60 journal articles. Ventzek was Chair of the American Vacuum Society's Plasma Science and Technology Division, Chair of the GEC, and a professor at Keio University.

Ventzek's work has been cited a number of times.[3]

Awards and recognition

In 1994, Peter Ventzek, together with Dr. Mark Kushner, Seung Choi, and Robert Hoekstra, received the Technical Excellence Award for research at the University of Illinois at Urbana-Champaign on computer modeling of plasma reactors.[4]

In 2006, Ventzek received NOGLSTP GLBT Engineer Award, which recognizes a GLBT Engineer who has made outstanding contributions in their field. This award honors Ventzek's contributions to improvements in the semiconductor industry as well as his support of GLBT employees at Freescale.[5]

In 2013, Ventzek received the plasma science and technology award for outstanding contributions to the field granted by the American Vacuum Society.[6]

References
  1. 聞き手/鈴木 元幸 (1996). "A Professor from Abroad at Hokkaido University". The Journal of the Institute of Electrical Engineers of Japan. 116 (5): 294–294. doi:10.1541/ieejjournal.116.294.
  2. "Plasma etch challenges for next-generation semiconductor manufacturing". spie.org. Retrieved 2019-10-09.
  3. "Google Scholar". scholar.google.com. Retrieved 2019-10-09.
  4. "SRC: Technical Excellence Award - SRC". www.src.org. Retrieved 2019-10-09.
  5. "NOGLSTP to honor GLBT Scientist, Engineer, Educator of Year".
  6. "Division/Group Professional Awards". The American Vacuum Society. Retrieved 2019-10-08.
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